Advancements towards single site information storage and processing using HfO



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Figure : XRD patterns of the as-deposited and annealed films. The as-deposited (black) is consistent with amorphous HfO2. The offset is organized such that the anneal with the highest thermal budget is on the top, lowest on the bottom.

Furthermore, ReRAM Solutions has conducted experiments which show the forming process may be eliminated by conducting anneals with high thermal budgets. This data is presented in Figure 9 below. The as-deposited sample shows forming voltages in excess of 15 volts. As the temperature and time of the annealing process increases, we see a decrease in the forming voltage until the initial switch occurs on the same order of magnitude as normal switching. This trend suggests that crystallization and the growth of grains lowers the energy barrier for the electrochemical migration of copper. It is this trend which ReRAM Solutions wishes to exploit.


Figure : Forming process mitigation. Green curve represents Forming voltage, blue and red curves represent typical switching events.

VII. Commercialization and Budget Justification



Company Information

ReRAM Solutions is an early stage business which seeks to specialize in the fabrication of new electronic structures using Resistive Random Access Memory. Existing upstream from computer chip manufacturers, ReRAM Solutions’ niche is to provide an alternative route to Moore’s Law through ReRAM systems engineering. The company currently staffs a total of 4 employees, two of which are Ph.D. level with a third expected to join within the next few months. A strategic partner of and located at the College of Nanoscale Science and Engineering (CNSE), the company is able to leverage high quality research and development facilities which allow for in-house development of technology. The CNSE operates as a consortium, bringing together over 250 corporations involved in semiconductor manufacturing. Under the consortia model, competing companies establish working relationships to lower the overall costs of manufacturing. As aforementioned, semiconductor research and manufacturing is extremely expensive, and therefore it is advantageous for firms to work together to lower costs. This is achieved by pooling money and sharing research equipment. Over $14 billion has been invested in CNSEs facilities, creating a world class research environment. The environment fosters a sense of collaboration between competitors. Such readiness to work with competitors will prove advantageous during ReRAM Solutions’ search for Phase III investors.


As a strategic partner of the CNSE, we have access to exclusive avenues of commercialization. Invention disclosures will be processed by CNSE’s Office for Technology Innovation and Commercialization. The CNSE retains full rights to any proprietary materials, processes, etc. When appropriate, a licensing agreement with the CNSE will be reached which will transfer intellectual property over to ReRAM Solutions. Intellectual property will be leveraged to reach contractual and licensure agreements with companies within the memory market.
Market Opportunity

Ultimately S3P technology aims to disrupt current forms of Non-Volatile Memory (NVM) and thus is a good indicator of future markets. The market size for NVM is assessed in Figure 9. Currently, market consumption can be broken down into several categories, including cache memory storage, industrial and transportation uses, mass storage, mobile phones, and smart cards. By the end of 2013, it is estimated that the NVM market will have reached nearly $400 million. Our commercialization strategy, outlined in Figure 10, estimates ReRAM Solutions will enter the market in late 2016. At the point of entry, the market will be valued at $1 billion. Although other forms of memory will continue to exist, it is anticipated that ReRAM will head the market once S3P technology is adopted by major manufacturers. Other markets that will be targeted by S3P technology include the medical and defense industries. In 2012, the U.S. medical devices market was estimated at $120 billion. Even conservatively estimating the market share at 1%, this represents $1 billion. In 2013, the Department of Defense is expected to invest $69 billion in R&D for new technologies. Again, conservative estimates indicate S3P technology could encapsulate millions of dollars in defense contracts.





Figure 10: Market for Non-Volatile Memory through 2018. Graph indicates the market will grow in excess of $2 billion.

The nature of semiconductor research and manufacturing is extremely expensive. Deposition, lithography, metallization, and other processing tools can cost upwards of $1 million per tool. These large upfront costs create large barriers to entering the NVM market, only allowing for large corporations to maintain market space. In fact, the NVM market is largely controlled by only 5 players, namely Samsung, Micron, Sk Hynix, Toshiba and Sandisk. These companies represent yet another barrier to entry, i.e. competition. If ReRAM Solutions is to successfully and sustainably enter the market, alliances must be made with these competitors. Intellectual property which procures the market space encapsulated by S3P technology must be obtained and leveraged against the competition. ReRAM Solutions will use its membership as a strategic partner of the CNSE to gain access to Samsung, Micron, and Toshiba. The consortia model employed by the CNSE means all three of these companies are conducting R&D on-site, occupying the same space and using the same tools as ReRAM Solutions. Within the consortia model, competing companies develop licensing agreements which will allow members to share both intellectual property and the cost of tools. Under this atmosphere, ReRAM Solutions will be able to readily create an alliance within the NVM market, thus lowering the barriers to entry.


The technology described in this proposal will consolidate storage and memory elements employing ReRAM technology. S3P eliminates the need for load times, decreases parasitic power losses, and minimizes the amount of chip packaging required. These characteristics form the basis of proprietary claims. The end goal of this research program is to obtain intellectual property which may be licensed to companies such as Samsung, Micron, and Toshiba.


Commercialization Activities


Figure 11: Commercialization Milestones

Major commercialization milestones are outlined in Figure 11. Phase I research is geared towards component development, and is expected to be completed by the second quarter of year 2. Following the demonstration of competitively performing ReRAM, efforts to produce a S3P proof-of-concept will begin. It is expected that prototype development will take one year at most. Commercialization activities will largely take place during Phase II. ReRAM Solutions will fully capitalize on the consortia present at the CNSE during this period. Samsung, Micron, and Toshiba are targeted Phase III investors. Once an alliance is made, Phase III partners will catalyze the scaling S3P technology.


S3P is projected to be rapidly scaled to High Volume Manufacturing (HVM). ReRAM has been shown to be compatible with CMOS fabrication processes and is expected to hit the market as NVM in 2013. Processes involved in ReRAM fabrication include Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), Photolithography, and Rapid Thermal Anneal. Metrological analysis is also found in-line, offering easy avenues for failure analysis. Both the fabrication and the metrological equipment listed above are readily found in an industrial scale cleanroom. S3P technology requires no change in the cleanroom infrastructure and therefore is economically viable for memory manufacturers. Due to impending integration into CMOS processing, there is no anticipated obstacles to manufacturing.
Intellectual property will provide the necessary revenue. During negotiations with Phase III investors, it will be imperative to establish a licensing agreement which provides a sustainable source of revenue for ReRAM Solutions. An agreement which provides royalties per unit sold is noted as the most profitable route. This is seen as advantageous over an agreement which involves a single, up-front transaction. ReRAM Solutions believes S3P to be a disruptive technology with a long future. Capitalizing over a long period of time is therefore advantageous, providing a constant supply of revenue.
Budget Justification

The table below outlines the budget for the Phase I research program. In total, we are requesting $150,000 from the SBIR program.




Sponsor: NSF SBIR

 

Title: Advancements towards single site information storage and execution using HfO2 Resistive Memory Devices (RERAM )

Project Investigator: Nathaniel Cady

Co- Project Investigator :

 

 

Period of Time: 1 YRS

 

 

 

 

 

YEAR 1

 

 

 

 

Salaries

% Effort

Annual Salary

Total Cost

Requested Funding

Cost Share

Faculty

 

 

 

 

 

Nathaniel Cady

20%

$105,000

$20,900

$20,900

$0

 

 

 

$0

$0

$0

 

 

 

$0

$0

$0

Total State Paid employees

 

$20,900

$20,900

$0

RF Paid Employess

 

 

 

 

 

Michael Hovish

50%

$15,000.00

$7,500

$7,500

$0

 

 

 

$0

$0

$0

Total RF Paid Employees

 

 

$7,500

$7,500

$0

Graduate Students

FTE

 

 

 

 

Benjamin Briggs

50%

$21,840.00

$10,920.00

$10,920

$0

Name: TBD

 

 

$0.00

$0

$0

Total Graduate Students

50%

 

$10,920

$10,920

$0

Summer

 

 

 

 

 

 N/A

 

 

$0

$0

$0

 N/A

 

 

$0

$0

$0

Total Summer Salaries

0%

 

$0

$0

$0

Total Salaries

 

 

$39,320

$39,320

$0

Fringe Benefits

Rate %

$ Base

 

 

 

State Employees

50.81%

$20,900

$10,619

$10,619

$0

RF Employees *

45.00%

$7,500

$3,375

$3,375

$0

Graduate Students *

16.00%

$10,920

$1,747

$1,747

$0

Summer

17.00%

$0

$0

$0

$0

Total Fringe Benefits

 

 

$15,742

$15,742

$0

Total Salaries and Fringe Benefits

 

$55,062

$55,062

$0

Other Direct Costs - Attach Details for any item listed below







 

Equipment: Cleanroom access RPI (Cu depositions)

$20,000

$20,000

$0

*Tuition

$27,800

$27,800

$0

Travel

$2,000

$2,000

$0

Materials & Supplies: Shadow Mask set, Metal Targets

$5,300

$5,300

$0

Publications

$4,000

$4,000

$0

 

 

 

 

$0

$0

 

 

 

 

$0

$0

 

 

 

 

 

 

Total Other Direct Costs

 

 

$59,100

$59,100

$0

TOTAL DIRECT COSTS

 

 

$114,162

$114,162

$0

Facilities and Administrative Expense

Rate %

Base MTDC

 



 

Does not incl:equip, install,tuit

53.00%

$66,362

$35,172

$35,172

$0.00

Total Estimated Project Cost

 

 

$149,334

$149,334

$0


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