Background Statement for semi draft Document 5556 Line Item Revision to semi s2-0712b, Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment



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Background Statement for SEMI Draft Document 5556
Line Item Revision to SEMI S2-0712b, Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment

Revisions to §19 “Seismic Protection”


Notice: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this Document.
Notice: Recipients of this Document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided.
Note: Additions are indicated by underline and deletions are indicated by strikethrough.
The voting result of this ballot will be reviewed by the Seismic Protection Task Force on March 26, 2015 and will be adjudicated at the Japan EHS Committee Meeting on April 17, 2015 at SEMI Japan office, Tokyo, Japan.
Background Statement
The Seismic Protection Task Force proposes the line item change to SEMI S2-0712b.
[History]

At the start of this revision activity, majority of global EH&S community seemed to think unanimously that the current seismic forces should be updated as the UBC, which was basis for current criteria, had expired. It was originally agreed, as a result of discussions within Japan and with other regions, that those seismic force values should be updated to the most stringent set of seismic force calculation criteria among applicable local requirements (e.g., regulations, Standards) for regions in which known semiconductor manufacturing site is located.

TF found, however, that any single requirement of any region, (e.g., ASCE < US>, European, Taiwan,

Japan) couldn’t satisfy above condition as each requirement based on different assumptions and equations. While the highest calculated value of horizontal force is obtained based on one of those regional requirement, the highest vertical force may be obtained on another of them.


[Justification of this proposal]

Furthermore, while current S2 criteria don’t give highest value for horizontal or vertical force, it is consistently high enough for both directions. Considering the fact that no equipment that was designed and anchored in accordance with current S2 seismic protection criteria reported to be overturned or significantly moved relatively to the floor in recent three earthquakes experienced in Japan (i.e., Great Hanshin-Awaji Earthquake,

Niigata Chuetsu Earthquake and Great East Japan Earthquake), each of which affected location include volume production semiconductor fabs, the TF was convinced that S2 should be regarded as a field proven criteria.
For the reasons stated above, the TF decided to keep the seismic design loads criteria of SEMI S2 §19 and the anchoring method and updated other part for clarity and address some concerns of users. It was also decided to have typical regional criteria to be added for convenience in the Related Information section.
The ballot results will be reviewed and adjudicated at the meetings indicated in the table below. Check www.semi.org/standards under Calendar of Events for the latest update.
Line Item 1 Revision to §19 “Seismic Protection”

Part A Revision to “§19 Seismic Protection”

Part B Revision to “Related Information 4 Seismic Protection”
Review and Adjudication Information





Task Force Review

Committee Adjudication

Group:

Seismic protection Task Force

Japan TC Chapter of Global

EH&S Technical Committee



Date:

March 26, 2015

April 17, 2015

Time & Timezone:

10:00- JST

13:00- JST

Location:

SEMI Japan, Tokyo Office

SEMI Japan, Tokyo Office

City, State/Country:

Tokyo, Japan

Tokyo, Japan

Leader(s):

Eiji Nakatani (SCREEN Semiconductor Solutions)

Supika Mashiro (Tokyo Electron)

Hidetoshi Sakura (intel)

Moray Crawford (Hatsuta)


Standards Staff:

Naoko Tejima

81.3.3222.5804



Naoko Tejima

81.3.3222.5804




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